STUDY OF THE ION ENERGY-DISTRIBUTION DURING PHYSICAL VAPOR-DEPOSITION OF TIN

被引：20

作者：

NESLADEK, M ^{[1
]}

QUAEYHAEGENS, C ^{[1
]}

WOUTERS, S ^{[1
]}

STALS, LM ^{[1
]}

BERGMANN, E ^{[1
]}

RETTINGHAUS, G ^{[1
]}

机构：

[1] BALZERS AG,FL-9496 BALZERS,LIECHTENSTEIN

来源：

SURFACE & COATINGS TECHNOLOGY | 1994年 / 68卷

关键词：

D O I：

10.1016/0257-8972(94)90183-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The energetic distribution of ions in a triode ion plating configuration during TiN deposition was investigated. The fluxes of different ions such as Ti+, N+, N-2(+), TiN+, TiAr+ impinging on the substrate, for various N partial pressures were measured by mass-energy spectrometry. The potential distribution in the plasma and the total ion flux towards the substrate were evaluated by Langmuir plasma probing. A model of the potential distribution in the triode ion plating plasma configuration is suggested and the Ti ionization for various plasma conditions is discussed.

引用

页码：339 / 343

页数：5

共 12 条

[1]

CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P83

[2]

CRAWFORD FW, 1965, J APPL PHYS, V36, P135

[3] SOME METAL VAPOR IONIZATION MEASUREMENTS IN PLASMA BEAM EVAPORATION SYSTEMS [J].