PRECIPITATION OF COPPER IN SILICON

被引：73
作者：
DAS, G [1 ]
机构：
[1] IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
来源：
JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 10期
关键词：
D O I：
10.1063/1.1661982
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4459 / 4467
页数：9
相关论文
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