INTERPRETATION OF DISLOCATION PROPAGATION VELOCITIES IN STRAINED GEXSI1-X/SI(100) HETEROSTRUCTURES BY THE DIFFUSIVE KINK PAIR MODEL

被引:93
作者
HULL, R
BEAN, JC
BAHNCK, D
PETICOLAS, LJ
SHORT, KT
UNTERWALD, FC
机构
[1] AT and T Bell Laboratories, 600 Mountain Avenue, Murray Hill
关键词
D O I
10.1063/1.349440
中图分类号
O59 [应用物理学];
学科分类号
摘要
Experimental measurements of misfit dislocation velocities, obtained from in situ transmission electron microscope observations of strained Ge(x)Si1-x/Si(100) heterostructures, are compared with predictions of the diffusive double-kink (or "kink pair") model of dislocation propagation. Good agreement is observed between experiment and theory for buried strained layers with applied stresses in the range of hundreds of MPa. For very thin uncapped strained layers, the diffusive double-kink model does not describe experimental data well. In these structures better agreement between experiment and theory is obtained if we model single-kink nucleation at the epilayer free surface. We compare our experimental data to those of other groups, and show how our modeling can reconcile apparently disparate trends deduced by these other groups.
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页码:2052 / 2065
页数:14
相关论文
共 35 条
[1]  
Alexander H., 1969, SOLID STATE PHYS, V22, P27
[2]   GEXSI1-X/SI STRAINED-LAYER SUPERLATTICE GROWN BY MOLECULAR-BEAM EPITAXY [J].
BEAN, JC ;
FELDMAN, LC ;
FIORY, AT ;
NAKAHARA, S ;
ROBINSON, IK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :436-440
[3]   STRESS DEPENDENCE OF DISLOCATION GLIDE ACTIVATION-ENERGY IN SINGLE-CRYSTAL SILICON-GERMANIUM ALLOYS UP TO 2.6 GPA [J].
DODSON, BW ;
TSAO, JY .
PHYSICAL REVIEW B, 1988, 38 (17) :12383-12387
[4]   RELAXATION OF STRAINED-LAYER SEMICONDUCTOR STRUCTURES VIA PLASTIC-FLOW [J].
DODSON, BW ;
TSAO, JY .
APPLIED PHYSICS LETTERS, 1987, 51 (17) :1325-1327
[5]   EXPERIMENTAL-STUDY OF THE DOUBLE KINK FORMATION KINETICS AND KINK MOBILITY ON THE DISLOCATION LINE IN SI SINGLE-CRYSTALS [J].
FARBER, BY ;
IUNIN, YL ;
NIKITENKO, VI .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1986, 97 (02) :469-478
[6]   THE EFFECT OF FRICTIONAL STRESS ON THE CALCULATION OF CRITICAL THICKNESS IN EPITAXY [J].
FOX, BA ;
JESSER, WA .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (06) :2801-2808
[7]   DISLOCATIONS AND PLASTICITY IN SEMICONDUCTORS .1. DISLOCATION-STRUCTURES AND DYNAMICS [J].
GEORGE, A ;
RABIER, J .
REVUE DE PHYSIQUE APPLIQUEE, 1987, 22 (09) :941-966
[8]  
Gottschalk H., 1987, I PHYSICS C SERIES, V87, P339
[9]  
Heggie M.I., 1987, I PHYS C SER, V87, P367
[10]  
Hirsch P.B., 1981, I PHYS C SER, V60, P29