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INTERPRETATION OF DISLOCATION PROPAGATION VELOCITIES IN STRAINED GEXSI1-X/SI(100) HETEROSTRUCTURES BY THE DIFFUSIVE KINK PAIR MODEL
被引:93
|作者:
HULL, R
BEAN, JC
BAHNCK, D
PETICOLAS, LJ
SHORT, KT
UNTERWALD, FC
机构:
[1] AT and T Bell Laboratories, 600 Mountain Avenue, Murray Hill
关键词:
D O I:
10.1063/1.349440
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Experimental measurements of misfit dislocation velocities, obtained from in situ transmission electron microscope observations of strained Ge(x)Si1-x/Si(100) heterostructures, are compared with predictions of the diffusive double-kink (or "kink pair") model of dislocation propagation. Good agreement is observed between experiment and theory for buried strained layers with applied stresses in the range of hundreds of MPa. For very thin uncapped strained layers, the diffusive double-kink model does not describe experimental data well. In these structures better agreement between experiment and theory is obtained if we model single-kink nucleation at the epilayer free surface. We compare our experimental data to those of other groups, and show how our modeling can reconcile apparently disparate trends deduced by these other groups.
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页码:2052 / 2065
页数:14
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