ELECTRON-BEAM INDUCED DAMAGE OF ORGANIC-SOLIDS - IMPLICATIONS FOR ANALYTICAL ELECTRON-MICROSCOPY

被引:30
作者
ISAACSON, M [1 ]
机构
[1] UNIV CHICAGO, ENRICO FERMI INST, CHICAGO, IL 60637 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0304-3991(79)90193-1
中图分类号
TH742 [显微镜];
学科分类号
摘要
A summary of experimental observations of radiation damage of organic materials within the electron microscopy is presented. Consequences of this damage are discussed and the magnitude of the doses which produce such damage are compared to the doses necessary for detection and identification of small quantities of material. In general, it is found that the doses which produce damage are less than the doses necessary for detection of 1000 atoms. Methods which have been proposed to reduce the effects of radiation are thus considered in the context of reducing the detectable quantity of material. © 1979 North-Holland Publishing Company.
引用
收藏
页码:193 / 199
页数:7
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