CRYSTALLINE INTERMEDIATE PHASES IN THE FORMATION OF EPITAXIAL NISI2 ON SI(111)

被引：15
作者：
BENNETT, PA
HALAWITH, BN
JOHNSON, AP
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词：
D O I：
10.1116/1.574932
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
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页码：2121 / 2126
页数：6
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