COSI2 MICROSTRUCTURES BY MEANS OF A HIGH-CURRENT FOCUSED ION-BEAM

被引:43
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作者
BISCHOFF, L
TEICHERT, J
HESSE, E
PANKNIN, D
SKORUPA, W
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D O I
10.1116/1.587463
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:3523 / 3527
页数:5
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