ACTIVATED CHEMISORPTION OF CH4 ON Ni SURFACE AND La FILM

被引：1

作者：

Shao Shumin ^{[1
]}

Xi Guangkang ^{[1
]}

Wang Junrong ^{[1
]}

Li Shenglin ^{[1
]}

Yang Xuezhu ^{[1
]}

Wang Jinhe ^{[1
]}

Zhou Zhiqiang ^{[1
]}

He Tianxi ^{[1
]}

Yu Baoxia ^{[1
]}

机构：

[1] Nankai Univ, Dept Elect Sci, Tianjin 300071, Peoples R China

来源：

ACTA PHYSICO-CHIMICA SINICA | 1992年 / 8卷 / 06期

关键词：

CH4; Ni; La; Activated chemisorption; Molecular beam technique;

D O I：

10.3866/PKU.WHXB19920610

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of translational kinetic energy E-k on the activated chemisorption of CH4 on Ni (polycrystal) surface and La film has been investigated using supersonic molecular beam technique. No dissociative adsorption was observed for CH4/Ni system when E-k <= 58.5 kJ . mol(-1) and for CH4/La system when E-k <= 52.3 kJ . mol(-1). Above these threshold values, the initial sticking probability s(4) increases linearly from 0 to 0.54 for CH4/Ni system as E-k increases from 58.5 to 63.8kJ . mol(-1) and from 0 to 0.49 for CH4/La system as E-k increases from 52.3 to 63.8 kJ . mol(-1). These results indicate that a rather direct chemisorption process, rather than a classical precursor mechanism proceeds in these systems. Finally the apparent activation energies obtained are 46.8 kJ . mol(-1) and 38.1 kJ . mol(-1) for CH4/Ni and CH4/La systems respectively.

引用

页码：767 / 771

页数：5