OXIDATION-KINETICS OF ALUMINUM NITRIDE

被引：63

作者：

SURYANARAYANA, D

机构：

[1] Systems Technology Division, IBM Corporation, Endicott, New York

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1990年 / 73卷 / 04期

关键词：

aluminum nitride; kinetics; modeling; oxidation; particle size;

D O I：

10.1111/j.1151-2916.1990.tb05167.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thermal oxidation kinetics of aluminum nitride (AlN) powders, having fine‐ and coarse‐particle‐size distributions, were studied using thermogravimetric analysis (TGA). The kinetics showed dependence on the particle‐size parameter, and the experimental TGA data were curve fitted using empirical mass relations employing both linear and parabolic models. The simulations predicted mixed kinetics in AlN oxidation. Copyright © 1990, Wiley Blackwell. All rights reserved

引用

页码：1108 / 1110

页数：3

共 10 条

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