ROOM-TEMPERATURE, ELECTRIC-FIELD INDUCED CREATION OF STABLE DEVICES IN CULNSE2 CRYSTALS

被引:65
作者
CAHEN, D
GILET, JM
SCHMITZ, C
CHERNYAK, L
GARTSMAN, K
JAKUBOWICZ, A
机构
[1] Department of Materials and Interfaces, Weizmann Institute of Science, Rehovot
[2] Institut für SOLARE Energieversorgungstechnik, Kassel
[3] IBM Research Laboratories, Rüschlikon
关键词
D O I
10.1126/science.258.5080.271
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Multiple-junction structures were formed, on a microscopic scale, at room temperature, by the application of a strong electric field across originally homogeneous crystals of the ternary chalcopyrite semiconductor CuInSe2. After removal of the electric field, the structures were examined with electron beam-induced current microscopy and their current-voltage characteristics were measured. Bipolar transistor action was observed, indicating that sharp bulk junctions can form in this way at low ambient temperatures. The devices are stable under normal (low-voltage) operating conditions. Possible causes for this effect, including electromigration and electric field-assisted defect reactions, are suggested.
引用
收藏
页码:271 / 274
页数:4
相关论文
共 31 条
[1]   A CHEMICAL APPROACH FOR THE MICROSCOPIC MECHANISM OF FAST ION-TRANSPORT IN SOLIDS [J].
ANIYA, M .
SOLID STATE IONICS, 1992, 50 (1-2) :125-129
[2]   PHASE-RELATIONS IN THE CU, IN, SE SYSTEM AND THE PROPERTIES OF CULNSE2 SINGLE-CRYSTALS [J].
BACHMANN, KJ ;
FEARHEILEY, M ;
SHING, YH ;
TRAN, N .
APPLIED PHYSICS LETTERS, 1984, 44 (04) :407-409
[3]  
CAHEN D, 1990, J ELECTRON MATER, V19, P23
[4]  
CAHEN D, 1987, TERNARY MULTINARY CO, VTMC, P433
[5]  
CHERNYAK L, UNPUB
[6]  
DAGAN G, IN PRESS J PHYS CHEM
[7]  
ELAZAB MI, 1980, IEEE T ELECTRON DEV, V27, P253
[8]   MOBILITY OF IMPURITY IONS IN GERMANIUM AND SILICON [J].
FULLER, CS ;
SEVERIENS, JC .
PHYSICAL REVIEW, 1954, 96 (01) :21-24
[9]  
GARTSMAN K, IN PRESS APPL PHYS L
[10]   ELECTROMIGRATION IN METALS [J].
HO, PS ;
KWOK, T .
REPORTS ON PROGRESS IN PHYSICS, 1989, 52 (03) :301-348