COMPUTER ANALYSIS OF FREQUENCY-DEPENDENT RESISTANCE OF METAL FILMS

被引：6
作者：
CROWELL, AD
DESHPANDE, SM
JUENKER, DW
机构：
来源：
PHYSICA | 1969年 / 44卷 / 04期
关键词：
D O I：
10.1016/0031-8914(69)90151-7
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：614 / +
页数：1
相关论文
共 7 条
[1]   HIGH-FREQUENCY RESISTANCE OF THIN FILMS [J].
BROUDY, R ;
LEVINSTEIN, H .
PHYSICAL REVIEW, 1954, 94 (02) :285-289
[2]   HIGH-FREQUENCY CHARACTERISTICS OF LEAD SULPHIDE AND LEAD SELENIDE LAYERS [J].
CHASMAR, RP .
NATURE, 1948, 161 (4086) :281-282
[3]   ELECTRICAL CONDUCTION OF THIN METALLIC LAYERS AT HIGH FREQUENCIES DOWN TO LIQUID HELIUM TEMPERATURES [J].
HIRSCH, AA ;
BAZIAN, S .
PHYSICA, 1964, 30 (01) :258-&
[4]  
HIRSCH AA, 1968, PRIVATE COMMUNICATIO
[5]   CAPACITANCE EFFECTS IN THIN CONDUCTIVE FILMS [J].
HUMPHREY, JN ;
LUMMIS, FL ;
SCANLON, WW .
PHYSICAL REVIEW, 1953, 90 (01) :111-114
[6]   FREQUENCY DEPENDENCE OF THE AC RESISTANCE OF THIN SEMICONDUCTING FILMS [J].
LAX, M ;
SACHS, R .
PHYSICAL REVIEW, 1957, 107 (03) :650-655
[7]   IMPEDANCE MEASUREMENTS ON PBS PHOTOCONDUCTIVE CELLS [J].
RITTNER, ES ;
GRACE, F .
PHYSICAL REVIEW, 1952, 86 (06) :955-958
1