SEGREGATION AND TRANSPORT-COEFFICIENTS OF IMPURITIES AT THE SI/SIO2 INTERFACE

被引：54
|
作者：
SAKAMOTO, K
NISHI, K
ICHIKAWA, F
USHIO, S
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 04期
关键词：
D O I：
10.1063/1.338089
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1553 / 1555
页数：3
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