NIOBIUM NITRIDE JOSEPHSON TUNNEL-JUNCTIONS WITH OXIDIZED AMORPHOUS-SILICON BARRIERS

被引：32

作者：

SHINOKI, F

SHOJI, A

KOSAKA, S

TAKADA, S

HAYAKAWA, H

机构：

来源：

APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 04期

关键词：

D O I：

10.1063/1.92308

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：285 / 286

页数：2

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