HELIUM - ARGON INDUCTIVELY COUPLED PLASMA FOR PLASMA SOURCE-MASS SPECTROMETRY

被引：39

作者：

SHEPPARD, BS ^{[1
]}

SHEN, WL ^{[1
]}

DAVIDSON, TM ^{[1
]}

CARUSO, JA ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT CHEM,CINCINNATI,OH 45221

来源：

JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY | 1990年 / 5卷 / 08期

关键词：

HELIUM - ARGON INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; TRACE ELEMENT ANALYSIS; DETERMINATION OF HALIDES;

D O I：

10.1039/ja9900500697

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

An He-Ar mixed gas inductively coupled plasma (ICP) was investigated for use as an ion source for plasma mass spectrometry (MS). The addition of He to Ar produces a plasma capable of ionising high ionisation potential elements more efficiently than the pure Ar plasma. The best signal to noise ratios for metallic elements were obtained with a 20% He plasma, and for halides with a 30% He plasma. The He-Ar mixed gas plasma shows an improvement of one order of magnitude in the detection limits of several metallic elements studied and an improvement of two orders of magnitude for non-metals in comparison with Ar ICP-MS. Figures of merit, including detection limits, linear dynamic ranges, metal oxide ratios and doubly to singly charged ion ratios, are reported and compared with those for Ar ICP-MS.

引用

页码：697 / 700

页数：4

共 16 条

[1] APPLICATION OF HELIUM MICROWAVE-INDUCED PLASMA MASS-SPECTROMETRY TO THE DETECTION OF HIGH IONIZATION-POTENTIAL GAS-PHASE SPECIES [J].