HETEROGENEOUS KINETICS AND MASS-TRANSPORT IN CHEMICAL VAPOR-DEPOSITION PROCESSES .1. THEORETICAL DISCUSSION

被引：18

作者：

HITCHMAN, ML ^{[1
]}

机构：

[1] LABS RCA LTD, CH-8048 ZURICH, SWITZERLAND

来源：

关键词：

D O I：

10.1016/0146-3535(81)90005-8

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：249 / 281

页数：33

共 37 条

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[8] The flow due to a rotating disc.
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[10] A STAGNANT LAYER MODEL FOR EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR
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