共 9 条
- [1] INSITU CLEANING OF SILICON SUBSTRATE SURFACES BY REMOTE PLASMA-EXCITED HYDROGEN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (04): : 621 - 626
- [3] ASHING OF ION-IMPLANTED RESIST LAYER [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10): : 2130 - 2136
- [4] RESIST STRIPPING IN AN O2 + H2O PLASMA DOWNSTREAM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02): : 357 - 361
- [5] PROPERTIES OF SILICON SURFACE CLEANED BY HYDROGEN PLASMA [J]. APPLIED PHYSICS LETTERS, 1991, 58 (13) : 1378 - 1380
- [7] KIKUCHI J, IN PRESS P MICROELEC
- [8] OHYA H, 1989, DENSHI SUPIN KYOMEI, P59
- [9] RONY PR, 1966, CHEM PHYS, V44, P2536