TEXTURED THIN-FILM SI SOLAR SELECTIVE ABSORBERS USING REACTIVE ION ETCHING

被引：43

作者：

CRAIGHEAD, HG

HOWARD, RE

TENNANT, DM

机构：

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 07期

关键词：

D O I：

10.1063/1.92015

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：653 / 655

页数：3

共 13 条

[1] OPTICAL-PROPERTIES OF SELECTIVELY ABSORBING NI-AL2O3 COMPOSITE FILMS [J].

CRAIGHEAD, HG ;

BUHRMAN, RA .

APPLIED PHYSICS LETTERS, 1977, 31 (07) :423-425

[2] EFFECT OF CATHODE MATERIALS ON REACTIVE ION ETCHING OF SILICON AND SILICON DIOXIDE IN A CF4 PLASMA [J].

EPHRATH, LM .

JOURNAL OF ELECTRONIC MATERIALS, 1978, 7 (03) :415-428

[3] TEXTURED SILICON - SELECTIVE ABSORBER FOR SOLAR THERMAL-CONVERSION [J].

GITTLEMAN, JI ;

SICHEL, EK ;

LEHMANN, HW ;

WIDMER, R .

APPLIED PHYSICS LETTERS, 1979, 35 (10) :742-744

[4]

HAAS G, 1956, J OPT SOC AM, V46, P31

[5] PROFILE CONTROL BY REACTIVE SPUTTER ETCHING [J].

LEHMANN, HW ;

WIDMER, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :319-326

[6] Plasma Etching of Titanium for Application to the Patterning of Ti-Pd-Au Metallization [J].

Mogab, C. J. ;

Shankoff, T. A. .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) :1766-1771

[7]

RICHIE IT, 1977, APPL OPTICS, V16, P1438

[8] COMPETITIVE MECHANISMS IN REACTIVE ION ETCHING IN A CF4 PLASMA [J].

SCHWARTZ, GC ;

ROTHMAN, LB ;

SCHOPEN, TJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) :464-469

[9]

Seraphin BO, 1976, OPTICAL PROPERTIES S

[10] THERMAL-RADIATION FROM METAL-SURFACES [J].

SIEVERS, AJ .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1978, 68 (11) :1505-1516

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