SULFUR ADATOM DIFFUSION ON THE CU(111) SURFACE

被引:35
|
作者
HINCH, BJ
FRENKEN, JWM
ZHANG, G
TOENNIES, JP
机构
[1] RUTGERS STATE UNIV,SURFACE MODIFICAT LAB,PISCATAWAY,NJ 08855
[2] FOM,INST ATOM & MOLEC PHYS,1098 SJ AMSTERDAM,NETHERLANDS
[3] MAX PLANCK INST STROMUNGSFORSCH,W-3400 GOTTINGEN,GERMANY
关键词
D O I
10.1016/0039-6028(91)90559-B
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper presents the first low-energy, quasi-elastic He-atom scattering study of adsorbate atom diffusion. At 820 K sulfur adatoms segregated onto the close-packed (111) surface of a copper crystal at a rate approximately 0.01 ML/h. These adatoms produce significant diffuse intensity of scattered He and, as evident from the quasielastic energy broadening, are highly mobile. The diffusion coefficient (D = 2.9 x 10(-5) cm2 s-1) exhibits no surface coverage dependence, indicating relatively weak sulfur-sulfur interactions on the Cu(111) substrate.
引用
收藏
页码:288 / 300
页数:13
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