THERMOELECTRIC PROPERTIES OF BORON PHOSPHIDE

被引:15
作者
KUMASHIRO, Y
HIRABAYASHI, M
KOSHIRO, T
OKADA, Y
机构
[1] Electrotechnical lab, Japan
来源
JOURNAL OF THE LESS-COMMON METALS | 1988年 / 143卷 / 1-2期
关键词
Semiconducting Films--Chemical Vapor Deposition - Semiconductor Materials--Electric Properties - Thermoelectricity;
D O I
10.1016/0022-5088(88)90040-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper describes the thermoelectric properties of boron phosphide wafers prepared using chemical vapor deposition and the thermal constants of a sintered boron phosphide specimen prepared using the r.f. hot pressing technique. The electric conductivity of the n-type boron phosphide wafers increases with temperature, becomes constant and then begins to decrease with temperature. In p-type wafers the conductivity increases with temperature and with a further increase in temperature the intrinsic conduction region is reached. The absolute thermoelectric power of n-type materials has an almost constant value of 500 μV K-1, but it begins to decrease at a temperature of 650 K owing to the creation of acceptors. The thermoelectric power of p-type materials decreases with increasing temperature, indicating that acceptors and donors contribute to the conduction. Thermal constants were obtained by the laser flash method and were measured using sintered disks as standards. Thermal diffusivity, heat capacity and the corresponding calculated thermal conductivity have an accuracy within ±5 percent up to 700°C.
引用
收藏
页码:159 / 165
页数:7
相关论文
共 10 条