ION-BEAM MIXING OF NI/TI BILAYER THIN-FILMS

被引：2
|
作者：
RAI, AK
BHATTACHARYA, RS
RASHID, MH
机构：
[1] Universal Energy Systems Inc,, Dayton, OH, USA, Universal Energy Systems Inc, Dayton, OH, USA
来源：
THIN SOLID FILMS | 1986年 / 137卷 / 02期
关键词：
ELECTRONS - Diffraction - ION BEAMS - THERMODYNAMIC PROPERTIES - TITANIUM AND ALLOYS - Thin Films;
D O I：
10.1016/0040-6090(86)90032-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Amorphization by ion beam mixing of bilayered samples consisting of nickel and titanium layers, each 50 nm thick, has been studied by selected area electron diffraction, plan and cross-sectional view transmission electron microscopy and Rutherford backscattering spectroscopy. Amorphization occurred on irradiation with 1 Mev Au** plus ions at fluences ranging from 3 multiplied by 10**1**9 to 2 multiplied by 10**2**0 m** minus **2. Cross-sectional transmission electron microscopy revealed that amorphization starts close to the original Ni-Ti ; interface. It has been shown that collisional processes alone cannot account for the observed amount of mixing. A model based on thermodynamics has been found to predict an amount of mixing higher than that observed experimentally.
引用
收藏
页码：305 / 313
页数：9
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